Barrier layer formation for conductive feature

ABSTRACT

Embodiments described herein relate generally to one or more methods for forming a barrier layer for a conductive feature in semiconductor processing. In some embodiments, an opening is formed through a dielectric layer to a conductive feature. A barrier layer is formed in the opening along a sidewall of the dielectric layer and on a surface of the conductive feature. Forming the barrier layer includes depositing a layer including using a precursor gas. The precursor gas has a first incubation time for deposition on the surface of the conductive feature and has a second incubation time for deposition on the sidewall of the dielectric layer. The first incubation time is greater than the second incubation time. A conductive fill material is formed in the opening and on the barrier layer.

BACKGROUND

The semiconductor integrated circuit (IC) industry has experiencedexponential growth. Technological advances in IC materials and designhave produced generations of ICs where each generation has smaller andmore complex circuits than the previous generation. In the course of ICevolution, functional density (e.g., the number of interconnecteddevices per chip area) has generally increased while geometry size(e.g., the smallest component (or line) that can be created using afabrication process) has decreased. This scaling down process generallyprovides benefits by increasing production efficiency and loweringassociated costs. However, scaling down has also led to challenges thatmay not have been presented by previous generations at largergeometries.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIGS. 1 through 5 are cross-sectional views of respective intermediatestructures during an example method for forming a conductive feature inaccordance with some embodiments.

FIG. 6 is a flow chart of a method for forming a barrier layer in aconductive feature in accordance with some embodiments.

FIG. 7 is a graph illustrating aspects of formation of a barrier layerin a conductive feature in accordance with some embodiments.

FIGS. 8 and 9 are cross-sectional views of respective intermediatestructures during another example method for forming a conductivefeature in accordance with some embodiments.

FIGS. 10 and 11 are cross-sectional views of respective intermediatestructures during another example method for forming a conductivefeature in accordance with some embodiments.

FIG. 12 is a flow chart of a method for forming a barrier layer in aconductive feature in accordance with some embodiments.

FIG. 13 is a schematic of a deposition tool for forming a barrier layerin a conductive feature in accordance with some embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

Embodiments described herein relate generally to one or more methods forforming a barrier layer for a conductive feature in semiconductorprocessing. Generally, a deposition process, such as an atomic layerdeposition (ALD), for depositing a layer may implement a precursor thathas an incubation time difference dependent upon the underlyingsurfaces, such as a dielectric surface or a conductive (e.g., metal)surface, on which the layer is deposited. In some examples, acarbon-rich tantalum nitride precursor gas is used in an ALD process todeposit a carbon-rich tantalum nitride layer, which is used to implementa barrier layer. In some examples, the carbon-rich tantalum nitrideprecursor gas has a lower incubation time for depositing the carbon-richtantalum nitride layer on a dielectric surface than for depositing thecarbon-rich tantalum nitride layer on a conductive (e.g., metal)surface. Hence, the carbon-rich tantalum nitride layer can have areduced thickness on the conductive surface compared to on thedielectric surface. These thicknesses may be advantageous to reduce aresistance to the conductive feature on which the layer is formedbecause of the reduced thickness, while maintaining sufficient diffusionbarrier properties at the dielectric surface. Some examples can furtherimplement, for example, a carbon-poor tantalum nitride layer with thecarbon-rich tantalum nitride layer, which together are used to implementa barrier layer. Other advantages or benefits may also be achieved.

Some embodiments described herein are in the context of Back End Of theLine (BEOL) processing. Other processes and structures within the scopeof other embodiments may be performed in other contexts, such as inMiddle End Of the Line (MEOL) processing and other contexts. Variousmodifications are discussed with respect to disclosed embodiments;however, other modifications may be made to disclosed embodiments whileremaining within the scope of the subject matter. A person havingordinary skill in the art will readily understand other modificationsthat may be made that are contemplated within the scope of otherembodiments. Although method embodiments may be described in aparticular order, various other method embodiments may be performed inany logical order and may include fewer or more steps than what isdescribed herein.

FIGS. 1 through 5 illustrate cross-sectional views of respectiveintermediate structures during an example method for forming aconductive feature in accordance with some embodiments. FIG. 1illustrates a first dielectric layer 22 over a semiconductor substrate20. The semiconductor substrate 20 may be or include a bulksemiconductor, a semiconductor-on-insulator (SOI) substrate, or thelike, which may be doped (e.g., with a p-type or an n-type dopant) orundoped. In some embodiments, the semiconductor material of thesemiconductor substrate 20 may include elemental semiconductor likesilicon (Si) and germanium (Ge); a compound semiconductor; an alloysemiconductor; or a combination thereof.

Various devices may be on the semiconductor substrate 20. For example,the semiconductor substrate 20 may include Field Effect Transistors(FETs), such as Fin FETs (FinFETs), planar FETs, vertical gate allaround FETs (VGAA FETs), or the like; diodes; capacitors; inductors; andother devices. Devices may be formed wholly within the semiconductorsubstrate 20, in a portion of the semiconductor substrate 20 and aportion of one or more overlying layers, and/or wholly in one or moreoverlying layers, for example. Processing described herein may be usedto form and/or to interconnect the devices to form an integratedcircuit. The integrated circuit can be any circuit, such as for anApplication Specific Integrated Circuit (ASIC), a processor, memory, orother circuit.

The first dielectric layer 22 is above the semiconductor substrate 20.The first dielectric layer 22 may be directly on the semiconductorsubstrate 20, or any number of other layers may be disposed between thefirst dielectric layer 22 and the semiconductor substrate 20. Forexample, the first dielectric layer 22 may be or include an Inter-LayerDielectric (ILD) or an Inter-Metal Dielectric (IMD). The firstdielectric layer 22, for example, may be or comprise a low-k dielectrichaving a k-value less than about 4.0, such as about 2.0 or even less. Insome examples, the first dielectric layer 22 comprises phosphosilicateglass (PSG), borophosphosilicate glass (BPSG), fluorosilicate glass(FSG), SiO_(x)C_(y), Spin-On-Glass, Spin-On-Polymers, silicon carbonmaterial, a compound thereof, a composite thereof, or a combinationthereof.

A conductive feature 24 is in and/or through the first dielectric layer22. The conductive feature 24 may be or include a gate structure of atransistor, a contact plug to a gate structure of a transistor and/or toa source/drain region of a transistor, a conductive line and/or aconductive via. For example, the first dielectric layer 22 may includean ILD, and the conductive feature 24 may include a gate electrode(e.g., tungsten, cobalt, etc.) in the ILD formed using a replacementgate process, for example. In another example, the first dielectriclayer 22 may be an ILD, and the conductive feature 24 may include acontact plug. The contact plug may be formed by forming an openingthrough the ILD to, for example, a gate electrode and/or source/drainregion of a transistor formed on the semiconductor substrate 20. Thecontact plug can include an adhesion layer (e.g., Ti, etc.), a barrierlayer (e.g., TiN, etc.) on the adhesion layer, and a conductive fillmaterial (e.g., tungsten, cobalt, etc.) on the barrier layer. In yetanother example, the first dielectric layer 22 may be an IMD, and theconductive feature 24 may include a conductive line and/or a conductivevia (collectively or individually, “interconnect structure”). Theinterconnect structure may be formed by forming an opening and/or recessthrough and/or in the IMD, for example, using a damascene process. Theinterconnect structure can include, for example, a barrier layer (suchas described herein) along sidewalls of the first dielectric layer 22and a metal fill material (e.g., copper, etc.).

An etch stop layer (ESL) 26 is over the first dielectric layer 22 andthe conductive feature 24. Generally, an ESL can provide a mechanism tostop an etch process when forming, e.g., conductive vias. An ESL may beformed of a dielectric material having a different etch selectivity fromadjacent layers or components. The ESL 26 is deposited on the topsurfaces of the first dielectric layer 22 and the conductive feature 24.The ESL 26 may comprise or be silicon nitride, silicon carbon nitride,silicon carbon oxide, carbon nitride, the like, or a combinationthereof, and may be deposited by chemical vapor deposition (CVD), plasmaenhanced CVD (PECVD), ALD, or another deposition technique.

A second dielectric layer 28 is over the ESL 26. For example, the seconddielectric layer 28 may be or include an IMD. The second dielectriclayer 28 is deposited on the top surface of the ESL 26. The seconddielectric layer 28, for example, may be or comprise a low-k dielectrichaving a k-value less than about 4.0, such as about 2.0 or even less. Insome examples, the second dielectric layer 28 comprises PSG, BPSG, FSG,SiO_(x)C_(y), Spin-On-Glass, Spin-On-Polymers, silicon carbon material,a compound thereof, a composite thereof, or a combination thereof. Thesecond dielectric layer 28 may be deposited using a CVD, such as PECVDor Flowable CVD (FCVD); spin-on coating; or another depositiontechnique. In some examples, a Chemical Mechanical Planarization (CMP)or another planarization process may be performed to planarize the topsurface of second dielectric layer 28.

The configuration of FIG. 1 is an example to illustrate aspects herein.In other examples, various other layers may be included, omitted, and/ormodified. A person having ordinary skill in the art will readilyunderstand various modifications that may be made.

FIG. 2 illustrates the formation of an opening 30 in and/or through theESL 26 and second dielectric layer 28 to the conductive feature 24. Theopening 30 can be or include a via opening, a trench, and/or the like.The opening 30 can be formed using photolithography and etch processes,such as in a damascene process. The etch process may include a reactiveion etch (RIE), neutral beam etch (NBE), inductive coupled plasma (ICP)etch, the like, or a combination thereof. The etch process may beanisotropic.

The sidewalls of the opening 30 are illustrated as being vertical. Inother examples, sidewalls of the opening 30 may taper together in adirection toward or away from the bottom of the opening 30. For example,the opening 30 may have a positive taper profile or a reentrant profile.

FIG. 3 illustrates the formation of a barrier layer 40 in the opening 30along the sidewalls of the second dielectric layer 28 and ESL 26 andalong the upper surface of the conductive feature 24. The barrier layer40 is further formed on the upper surface of the second dielectric layer28. Generally, in some examples, the barrier layer 40 includes tantalumnitride. A process for forming the barrier layer 40 is described in moredetail below with respect to FIG. 6. As shown in FIG. 3, the barrierlayer 40 has a first thickness T1 along the upper surface of theconductive feature 24 and has a second thickness T2 along the sidewallsof the second dielectric layer 28 and ESL 26. Generally, and as willbecome apparent from the description of FIG. 6, the second thickness T2is greater than the first thickness T1.

FIG. 4 illustrates the formation of a conductive fill material 42 on thebarrier layer 40, which fills the opening 30. The conductive fillmaterial 42 can be or include a metal fill, such as copper, tungsten,cobalt, aluminum, ruthenium, the like, or a combination thereof. Theconductive fill material 42 can be deposited by any acceptabledeposition process, such as CVD, physical vapor deposition (PVD),plating (e.g., electroless plating), the like, or a combination thereof.

FIG. 5 illustrates the removal of excess conductive fill material 42 andbarrier layer 40 to form a conductive feature (comprising the conductivefill material 42 and barrier layer 40) in the second dielectric layer28. Excess conductive fill material 42 and barrier layer 40 can beremoved using a planarization process, such as a CMP, which can formupper surfaces of the conductive fill material 42, barrier layer 40, andsecond dielectric layer 28 to be level. A conductive feature, such as ina damascene interconnect structure, can be formed, as illustrated inFIG. 5.

Although not illustrated in the figures, one or more additionaldielectric layers may be formed over the second dielectric layer 28 andconductive feature (including the conductive fill material 42 andbarrier layer 40). Additionally, an additional conductive feature, whichmay be formed similar to the illustrated conductive feature (includingthe conductive fill material 42 and barrier layer 40), can be formed inthe one or more additional dielectric layers and contacting the uppersurface of the illustrated conductive feature.

FIG. 6 is a flow chart of a method for forming the barrier layer 40 inthe conductive feature in accordance with some embodiments. The methodof FIG. 6 includes performing a cleaning process (operation 102),depositing a carbon-rich tantalum nitride layer (operation 104), andperforming a plasma treatment (operation 106). The cleaning process,deposition, and plasma treatment may be performed in situ in a same toolchamber in some examples.

In operation 102, a cleaning process is performed on the intermediatestructure of FIG. 2. The cleaning process can remove residual materialfrom the etch process that forms the opening 30, and can remove an oxidefrom the top surface of the conductive feature 24. In some examples, theconductive feature 24 can be or include copper, and a copper oxide canbe formed at the upper surface of the copper, for example, by the etchprocess of forming the opening 30, a CMP process when forming theconductive feature 24, and/or other processes. In those examples, thecleaning process can remove the copper oxide.

In some examples, the cleaning process includes exposing theintermediate structure of FIG. 2 to a plasma. The plasma can reduce anoxide formed on the conductive feature 24. The plasma can be or includea reducing gas, such as hydrogen (H₂). In some examples, the plasma is aremote plasma.

In operation 104, the carbon-rich tantalum nitride layer is deposited onthe cleaned intermediate structure. FIG. 6 illustrates an ALD processfor depositing the carbon-rich tantalum nitride layer in operation 104,although in other examples, another CVD process may be used to depositthe carbon-rich tantalum nitride layer. In conjunction with the plasmatreatment of operation 106, the ALD process may be referred to as aplasma enhance ALD (PEALD). Operation 104 includes, sequentially,pulsing a carbon-rich tantalum nitride precursor gas (operation 110) ina chamber, purging (operation 112) the chamber, pulsing a reactant gas(operation 114) in the chamber, and purging (operation 116) the chamber.In other examples, the order of the operations 110, 112, 114, and 116may be altered, such as operation 114 being performed before operation110. Operations 110, 112, 114, and 116 create a cycle of the ALDprocess. At operation 118, a determination is made whether another cycleis to be repeated, and if so, the cycle beginning at operation 110 isperformed again. The cycle can be repeated until a pre-determined numberof cycles have been performed to achieve a target thickness of thecarbon-rich tantalum nitride layer. In some examples, a number of cyclesto be performed is in a range from 10 cycles to 30 cycles, for example.

The ALD process can be performed in a chamber with a pressure in a rangefrom about 2 Torr to about 5 Torr, and with a temperature in a rangefrom about 250° C. to about 350° C., and more particularly, from about275° C. to about 325° C. A soak time for each pulse (operations 110,114) can be in a range from about 0.5 seconds to about 10 seconds. Aduration for each purge (operations 112, 116) can be in a range fromabout 0.5 seconds to about 10 seconds.

The carbon-rich tantalum nitride precursor gas for operation 110 can beor include Ta,[(3,4-eta)-alkyne] tris (N,N-alkylaminato)(Ta[N(CH₃)₂]₃(C₆H₁₀)), Ta[N(C₂H₅)₂]₃NC(CH₃)₃, and/or the like. In someexamples, the carbon-rich tantalum nitride precursor gas can have aconcentration of carbon of equal to or greater than about 25 atomicpercentage (at. %), such as in a range from about 25 at. % to about 40at. %. The reactant gas for operation 114 can be or include ammonia(NH₃), hydrazine (N₂H₂), and/or the like. The carbon-rich tantalumnitride precursor gas and the reactant gas for operations 110, 114,respectively, can be mixed with a carrier gas, which can be inert, suchas argon (Ar). Further, a gas for the purges of operations 112, 116 canbe an inert gas, such as argon (Ar).

Using the example ALD process in operation 104, a carbon-rich tantalumnitride layer can be deposited with a varying thickness dependent uponthe surface on which the layer is deposited. In some examples, thecarbon-rich tantalum nitride layer, as deposited, has a greaterthickness on dielectric surfaces (e.g., sidewalls of the seconddielectric layer 28 and ESL 26 in FIG. 3) compared to metallic surfaces(e.g., upper surface of the conductive feature 24 in FIG. 3). FIG. 7illustrates aspects of this difference in thicknesses. FIG. 7 is a graphillustrating the thickness of a deposited layer as a function of numberof deposition cycles. A first fitted-line 202 based on experimentalfirst data points 212 shows the thickness of the carbon-rich tantalumnitride layer deposited on a surface of a low-k dielectric (e.g., aSiO_(x)C_(y) material), and a second fitted-line 204 based onexperimental second data points 214 shows the thickness of thecarbon-rich tantalum nitride layer deposited on a surface of a metal(e.g., Cu). Deposition on the surface of the metal is shown to bedelayed relative to deposition on the surface of the low-k dielectric,which is believed to be due to a longer incubation time for depositionon the surface of the metal compared to the surface of the low-kdielectric. An incubation time difference 220 is illustrated in FIG. 7illustrating the longer incubation time. In some examples, theincubation time difference 220 may result in a difference between athickness on the surface of the low-k dielectric and a thickness on asurface of a metal being in a range from about 4 Å to about 6 Å. Afterthe incubation time has elapsed for the surfaces, deposition is atsubstantially the same rate (e.g., within about 3% of each other, suchas less than about 2.1%) regardless of the underlying surface.

It is believed that the carbon-rich tantalum nitride precursor gas has alarger steric hindrance that reduces adsorption on the metal (e.g., Cu)compared to carbon-poor tantalum nitride precursor gases. The largeorganic (e.g., C-containing) groups of the carbon-rich tantalum nitrideprecursor gas can provide a repulsive force from the metal that may notbe present with carbon-poor tantalum nitride precursor gases. Further,the low-k dielectric (e.g., SiO_(x)C_(y)) may have a lower adsorptionactivation energy compared to the metal (e.g., Cu) that permits thecarbon-rich tantalum nitride precursor gas to react more with the low-kdielectric in earlier cycles of the ALD process.

In operation 106, the carbon-rich tantalum nitride layer deposited inoperation 104 is treated using a plasma process. The plasma process canremove organic impurities. The plasma process can also densify thecarbon-rich tantalum nitride layer, which can improve diffusion barrierproperties of the layer. In some examples, the plasma process implementsa capacitively coupled plasma (CCP). The plasma process can use hydrogen(H₂) gas with a carrier gas, such as argon (Ar). The flow rate of thehydrogen gas can be in a range from about 50% to about 95% of the totalflow of gases (e.g., combined flow of hydrogen and carrier gas). Apressure of the plasma process can be in a range from about 1 Torr toabout 5 Torr. A temperature of the plasma process can be in a range fromabout 250° C. to about 350° C., which may be equal to the temperatureused for the deposition in operation 104. A power of the plasmagenerator of the plasma process can be in a range from about 100 W toabout 800 W and a frequency of the plasma generator can be about 13.56MHz, in a range from about 20 MHz to about 40 MHz, or another frequency.A duration of the treatment by the plasma process can be in a range fromabout 5 seconds to about 120 seconds.

The carbon-rich tantalum nitride layer can adsorb and/or react with theplasma to deplete the carbon-rich tantalum nitride layer of carbon andto densify the carbon-rich tantalum nitride layer. As deposited, thecarbon-rich tantalum nitride layer can have a concentration of carbon ofequal to or greater than about 15 at. %, such as in a range from about15 at. % to about 35 at. % (e.g., about 20 at. %). A density of thecarbon-rich tantalum nitride layer, as deposited, can be in a range fromabout 5 g/cm³ to about 7 g/cm³. After the plasma treatment, carbon fromthe carbon-rich tantalum nitride layer may be depleted, and hence, afterthe plasma treatment the carbon-rich tantalum nitride layer may bereferred to as a tantalum nitride layer, which may be carbon-poor.Further, the tantalum nitride layer may be more dense than theas-deposited carbon-rich tantalum nitride layer. After the plasmatreatment, the tantalum nitride layer can have a concentration of carbonin a range from about 1 at. % to about 5 at. %. A density of thetantalum nitride layer, after the plasma treatment, can be in a rangefrom about 11.0 g/cm³ to about 12.0 g/cm³. After the plasma treatment,the tantalum nitride layer that is formed can be the barrier layer 40 ofFIG. 3.

As stated previously, the first thickness T1 of the barrier layer 40 onthe upper surface of the conductive feature 24 is less than the secondthickness T2 of the barrier layer 40 on the sidewalls of the seconddielectric layer 28. The difference between the thicknesses T1, T2 canbe caused largely by the difference in incubation time during thedeposition in operation 104 of FIG. 6. In a particular example, thefirst thickness T1 can be in a range from about 14 Å to about 16 Å, andthe second thickness T2 can be about 20 Å. Hence, in this particularexample, the first thickness T1 can be less than the second thickness T2by an amount in a range from about 20% to about 30% of the secondthickness T2. In other examples, the difference expressed as apercentage can vary depending on, e.g., the second thickness T2. Asdescribed previously, after the incubation period difference, thecarbon-rich tantalum nitride layer can be deposited at substantially thesame rate on, e.g., the conductive feature 24 and on the seconddielectric layer 28. Hence, the difference between the thicknesses T1,T2 may remain substantially the same although the barrier layer 40 maybe formed at various thicknesses, and as, e.g., the second thickness T2increases, the difference between the thicknesses T1, T2 becomes less ofa percentage of the second thickness T2.

The differing thicknesses T1, T2 can enable beneficial barrierproperties of the barrier layer 40 for the second dielectric layer 28while reducing resistance between the conductive feature 24 and theconductive fill material 42. Generally, the thinner the barrier layer 40is between the conductive feature 24 and the conductive fill material42, the lower the resistance is between the conductive feature 24 andthe conductive fill material 42. Conversely, the thicker the barrierlayer 40 is between the conductive fill material 42 and the seconddielectric layer 28, the better the barrier layer 40 may preventdiffusion of the conductive fill material 42 into the second dielectriclayer 28. Hence, the barrier layer 40 can enable achieving a lowerresistance by having a thinner first thickness T1 along the conductivefeature 24 and can enable beneficial barrier properties by having athicker second thickness T2 along the sidewall of the second dielectriclayer 28.

Examples described below implement a barrier layer using a depositeddifferential carbon-concentration tantalum nitride layer. A differentialcarbon-concentration tantalum nitride layer can be implemented bymultiple (e.g., two or more) sub-layers (e.g., multilayer) and/or by agradient layer. In a multilayer implementation, each of multiplesub-layers can be deposited with different concentrations of carbon,which respective concentration of carbon is substantially uniformthroughout the sub-layer, by using different ones or different mixturesof a carbon-rich tantalum nitride precursor gas and a carbon-poortantalum nitride precursor gas. In a gradient layer implementation, agradient layer can be deposited with a substantially continuous gradientconcentration of carbon by using different ones or different mixtures ofa carbon-rich tantalum nitride precursor gas and a carbon-poor tantalumnitride precursor gas.

FIGS. 8 and 9 illustrate cross-sectional views of respectiveintermediate structures during an example method for forming aconductive feature in accordance with some embodiments. FIG. 8 shows thesemiconductor substrate 20, first dielectric layer 22, conductivefeature 24, ESL 26, second dielectric layer 28, and opening 30 asdescribed with respect to FIGS. 1 and 2 above.

FIG. 8 further illustrates the formation of a barrier layer in theopening 30 along the sidewalls of the second dielectric layer 28 and ESL26 and along the upper surface of the conductive feature 24. The barrierlayer is further formed on the upper surface of the second dielectriclayer 28. The barrier layer is implemented by, among other things,depositing a first sub-layer 50 and a second sub-layer 52 over the firstsub-layer 50. Generally, in some examples, the barrier layer includestantalum nitride. A process for forming the barrier layer, whichincludes depositing the first sub-layer 50 and the second sub-layer 52,is described in more detail below with respect to FIG. 12. As shown inFIG. 8, the barrier layer has a first thickness T1 along the uppersurface of the conductive feature 24 and has a second thickness T2 alongthe sidewalls of the second dielectric layer 28 and ESL 26. Generally,and as will become apparent from the description of FIG. 12, the secondthickness T2 is greater than the first thickness T1.

FIG. 9 illustrates the formation of a conductive fill material 54 on thebarrier layer, which fills the opening 30, and the removal of any excessconductive fill material 54 and barrier layer. The conductive fillmaterial 54 can be or include a metal fill, such as copper, tungsten,cobalt, aluminum, ruthenium, the like, or a combination thereof. Theconductive fill material 54 can be deposited by any acceptabledeposition process, such as CVD, PVD, plating (e.g., electrolessplating), the like, or a combination thereof. Excess conductive fillmaterial 54 and barrier layer can be removed using a planarizationprocess, such as a CMP, which can form upper surfaces of the conductivefill material 54, barrier layer, and second dielectric layer 28 to belevel. A conductive feature, such as in a damascene interconnectstructure, can be formed, as illustrated in FIG. 9.

FIGS. 10 and 11 illustrate cross-sectional views of respectiveintermediate structures during an example method for forming aconductive feature in accordance with some embodiments. FIG. 10 showsthe semiconductor substrate 20, first dielectric layer 22, conductivefeature 24, ESL 26, second dielectric layer 28, and opening 30 asdescribed with respect to FIGS. 1 and 2 above.

FIG. 10 further illustrates the formation of a barrier layer in theopening 30 along the sidewalls of the second dielectric layer 28 and ESL26 and along the upper surface of the conductive feature 24. The barrierlayer is further formed on the upper surface of the second dielectriclayer 28. The barrier layer is implemented by, among other things,depositing a first sub-layer 60, a second sub-layer 62 over the firstsub-layer 60, and a third sub-layer 64 over the second sub-layer 62.Generally, in some examples, the barrier layer includes tantalumnitride. A process for forming the barrier layer, which includesdepositing the first sub-layer 60, the second sub-layer 62, and thethird sub-layer 64, is described in more detail below with respect toFIG. 12. As shown in FIG. 10, the barrier layer has a first thickness T1along the upper surface of the conductive feature 24 and has a secondthickness T2 along the sidewalls of the second dielectric layer 28 andESL 26. Generally, and as will become apparent from the description ofFIG. 12, the second thickness T2 is greater than the first thickness T1.

FIG. 1i illustrates the formation of a conductive fill material 66 onthe barrier layer, which fills the opening 30, and the removal of anyexcess conductive fill material 66 and barrier layer. The conductivefill material 66 can be or include a metal fill, such as copper,tungsten, cobalt, aluminum, ruthenium, the like, or a combinationthereof. The conductive fill material 66 can be deposited by anyacceptable deposition process, such as CVD, PVD, plating (e.g.,electroless plating), the like, or a combination thereof. Excessconductive fill material 66 and barrier layer can be removed using aplanarization process, such as a CMP, which can form upper surfaces ofthe conductive fill material 66, barrier layer, and second dielectriclayer 28 to be level. A conductive feature, such as in a damasceneinterconnect structure, can be formed, as illustrated in FIG. 11.

FIG. 12 is a flow chart of a method for forming the barrier layer ofFIGS. 8 and 10 in the conductive feature in accordance with someembodiments. The method of FIG. 12 includes performing a cleaningprocess (operation 302), depositing a differential carbon-concentrationtantalum nitride layer (operation 304), and performing a plasmatreatment (operation 306). The cleaning process, deposition, and plasmatreatment may be performed in situ in a same tool chamber in someexamples. The cleaning process and plasma treatment can be the same asor similar to the cleaning process (operation 102) and plasma treatment(operation 106) of FIG. 6, respectively, and hence, details of theseprocesses are omitted here for brevity.

Operation 304 deposits a differential carbon-concentration tantalumnitride layer that has a varying concentration of carbon therein. Insome examples, the differential carbon-concentration tantalum nitridelayer can be multiple sub-layers each having substantially uniform butdifferent concentrations of carbon (e.g., having step increases ordecreases in the concentration of carbon). In some examples, thedifferential carbon-concentration tantalum nitride layer can be a layerhaving a substantially continuous gradient concentration of carbon. Insome examples, the differential carbon-concentration tantalum nitridelayer can have a combination of one or more sub-layers and asubstantially continuous gradient (e.g., one or more sub-layers eachhaving a uniform concentration while one or more sub-layers each have agradient concentration).

In operation 304, the differential carbon-concentration tantalum nitridelayer is deposited on the cleaned intermediate structure (as describedwith respect to FIG. 6). FIG. 12 illustrates an ALD process fordepositing the differential carbon-concentration tantalum nitride layerin operation 304, although in other examples, another CVD process may beused to deposit the differential carbon-concentration tantalum nitridelayer. Operation 304 includes, among other operations, sequentially,pulsing one or a mixture of a carbon-rich tantalum nitride precursor gasand a carbon-poor tantalum nitride precursor gas (operation 312) in achamber, purging (operation 314) the chamber, pulsing a reactant gas(operation 316) in the chamber, and purging (operation 318) the chamber.In other examples, the order of the operations 312, 314, 316, and 318may be altered, such as operation 316 being performed before operation312. Operations 312, 314, 316, and 318 create a cycle of the ALDprocess.

Before an initial cycle is performed, at operation 310, initial amountsor flow rates of the carbon-rich tantalum nitride precursor gas,carbon-poor tantalum nitride precursor gas, and reactant gas to besubsequently pulsed are determined. The determination at operation 310can be based on a recipe of the ALD process, which can implement adesired differential carbon-concentration tantalum nitride layeraccording to various design considerations, some of which are describedbelow. After the determination at operation 310 is made, a cycle,including operations 312, 314, 316, and 318, is performed. At operation320, a determination is made whether another cycle is to be repeated. Ifso, a determination is made in operation 322 as to whether any of theamounts of the precursor gases and/or reactant gas is to be altered forthe subsequent cycle. The determination of operation 322 can likewise bebased on the recipe. If the amounts are to be altered from thedetermination of operation 322, then, in operation 310, amounts or flowrates of the carbon-rich tantalum nitride precursor gas, carbon-poortantalum nitride precursor gas, and reactant gas to be subsequentlypulsed are determined, and another cycle is performed using thedetermined amounts. If the amounts are not to be altered from thedetermination of operation 322, then, another cycle is performed usingthe amounts previously determined and implemented in the precedingcycle. A pre-determined number of cycles can be performed to achieve atarget thickness of the differential carbon-concentration tantalumnitride layer.

The ALD process can be performed in a chamber with a pressure in a rangefrom about 2 Torr to about 5 Torr, and with a temperature in a rangefrom about 250° C. to about 350° C., and more particularly, from about275° C. to about 325° C., such as at 300° C. A soak time for each pulse(operations 312, 316) can be in a range from about 0.5 seconds to about10 seconds. A duration for each purge (operations 314, 318) can be in arange from about 0.5 seconds to about 10 seconds.

The carbon-rich tantalum nitride precursor gas for operation 312 can beor include Ta,[(3,4-eta)-alkyne] tris (N,N-alkylaminato)(Ta[N(CH₃)₂]₃(C₆H₁₀)), Ta[N(C₂H₅)₂]₃NC(CH₃)₃, and/or the like. In someexamples, the carbon-rich tantalum nitride precursor gas can have aconcentration of carbon of equal to or greater than about 25 at. %, suchas in a range from about 25 at. % to about 40 at. %. The carbon-poortantalum nitride precursor gas for operation 312 can be or includeTa[N(CH₃)₂]₅ and/or the like. In some examples, the carbon-poor tantalumnitride precursor gas can have a concentration of carbon of less thanabout 25 at. %, such as in a range from about 15 at. % to less thanabout 25 at. %. The reactant gas for operation 316 can be or includeammonia (NH₃), hydrazine (N₂H₂), and/or the like. The carbon-richtantalum nitride precursor gas, carbon-poor tantalum nitride precursorgas, and the reactant gas for operations 312, 316 can be mixed with acarrier gas, which can be inert, such as argon (Ar). Further, a gas forthe purges of operations 314, 318 can be an inert gas, such as argon(Ar).

An implementation of operation 304 is first described to achieve thebarrier layer of FIGS. 8 and 9. In operation 304, a first number ofcycles is performed using the carbon-rich tantalum nitride precursorgas, with no carbon-poor tantalum nitride precursor gas, to deposit thefirst sub-layer 50. Additionally, the reactant gas may be pulsed in thefirst number of cycles at a low percentage amount, such as equal to orless than 10% of the total flow (e.g., flow of the combined reactant gasand carrier gas). By performing this first number of cycles with thecarbon-rich tantalum nitride precursor gas without the carbon-poortantalum nitride precursor gas, the incubation time difference describedwith respect to FIGS. 6 and 7 may be used to deposit the first sub-layer50 (e.g., a carbon-rich tantalum nitride layer) with differentthicknesses on the upper surface of the conductive feature 24 and onsidewalls of the second dielectric layer 28. In some examples, the firstnumber of cycles permits the incubation time difference to elapse andpermits the first sub-layer 50 to begin growing on the upper surface ofthe conductive feature 24. Hence, in such examples, a maximum differencein thicknesses of the first sub-layer 50 (e.g., on the conductivefeature 24 versus on the second dielectric layer 28) can be achieved. Inother examples, the first number of cycles may not be sufficient topermit the incubation time difference to elapse.

To relate the deposition of the first sub-layer 50 to operation 304 morespecifically, at operation 310, the amounts of the precursor gases aredetermined to be 100% carbon-rich tantalum nitride precursor gas and 0%carbon-poor tantalum nitride precursor gas as the precursor gas (e.g.,without considering the carrier gas) to be pulsed in operation 312, andthe amount of the reactant gas is determined to be equal to or less than10% of the total flow (e.g., flow of the combined reactant gas andcarrier gas) to be pulsed in operation 318. The cycle (operations 312,314, 316, 318) is repeated the first number of cycles by operation 320,without the gases being altered by operation 322.

Further in operation 304 after the performance of the first number ofcycles, a second number of cycles is performed using the carbon-poortantalum nitride precursor gas, with no carbon-rich tantalum nitrideprecursor gas, to deposit the second sub-layer 52 (e.g., a carbon-poortantalum nitride layer). Additionally, the reactant gas may be pulsed inthe second number of cycles at a high percentage amount, such as in arange from about 10% to about 99% of the total flow (e.g., flow of thecombined reactant gas and carrier gas). In some examples, the depositionusing the carbon-poor tantalum nitride precursor gas generally does notexhibit the selectivity that can occur with the carbon-rich tantalumnitride precursor gas as described above. More particularly, in thoseexamples, there is generally no significant incubation time differenceand no significant difference in deposition rate based on the underlyingsurface on which the layer is deposited. Hence, the deposition of thesecond sub-layer 52 can be substantially uniform and conformal. Thesecond number of cycles can be sufficient to form the second sub-layer52 with a desired thickness.

To relate the deposition of the second sub-layer 52 to operation 304more specifically, after the completion of the first number of cycles,at operation 320, a determination is made to repeat the cycle toinitiate the second number of cycles. At operation 322, a determinationis made that the amounts of the gases are to be altered. In response, atoperation 310, the amounts of the precursor gases are determined to be0% carbon-rich tantalum nitride precursor gas and 100% carbon-poortantalum nitride precursor gas as the precursor gas (e.g., withoutconsidering the carrier gas) to be pulsed in operation 312, and theamount of the reactant gas is determined to be in a range from about 10%to about 99% of the total flow (e.g., flow of the combined reactant gasand carrier gas) to be pulsed in operation 318. The cycle (operations312, 314, 316, 318) is repeated the second number of cycles by operation320, without the gases subsequently being altered by operation 322. Atthe conclusion of the second number of cycles, at operation 320, adetermination is made that a cycle is to be not repeated, and then,operation 306 is performed.

In operation 306, the differential carbon-concentration tantalum nitridelayer deposited in operation 304 is treated using a plasma process.Generally, the plasma process can remove organic impurities and can alsodensify the differential carbon-concentration tantalum nitride layer.

The differential carbon-concentration tantalum nitride layer can adsorband/or react with the plasma to deplete the differentialcarbon-concentration tantalum nitride layer of carbon and to densify thedifferential carbon-concentration tantalum nitride layer. Thecarbon-rich tantalum nitride layer (e.g., first sub-layer 50), which hasa greater concentration of carbon than the carbon-poor tantalum nitridelayer (e.g., second sub-layer 52) can slow or retard the penetration ofthe plasma during the plasma treatment in operation 306, which canprevent some carbon depletion and damage of the second dielectric layer28 (e.g., a low-k dielectric layer).

As deposited, the carbon-rich tantalum nitride layer can have aconcentration of carbon equal to or greater than about 15 at. %, such asin a range from about 15 at. % to about 35 at. % (e.g., about 20 at. %),and the carbon-poor tantalum nitride layer can have a concentration ofcarbon less than about 15 at. %, such as in a range from about 1 at. %to less than about 15 at. % (e.g., about 5 at. %). A density of thecarbon-rich tantalum nitride layer, as deposited, can be in a range fromabout 5 g/cm³ to about 7 g/cm³, and a density of the carbon-poortantalum nitride layer, as deposited, can be in a range from about 8g/cm³ to about 10 g/cm³. After the plasma treatment, carbon from thecarbon-rich tantalum nitride layer and the carbon-poor tantalum nitridelayer may be depleted, and hence, after the plasma treatment thecarbon-rich tantalum nitride layer and the carbon-poor tantalum nitridelayer together may be referred to as a tantalum nitride layer, which maybe carbon-poor. Further, the tantalum nitride layer may be denser thanthe as-deposited respective sub-layers. After the plasma treatment, thefirst sub-layer 50 of the tantalum nitride layer can have aconcentration of carbon in a range from about 1 at. % to about 5 at. %,and the second sub-layer 52 of the tantalum nitride layer can have aconcentration of carbon in a range from about 1 at. % to about 3 at. %.For example, the first sub-layer 50 may have a greater concentration ofcarbon than the second sub-layer 52. A density of the first sub-layer 50of the tantalum nitride layer, after the plasma treatment, can be in arange from about 10.5 g/cm³ to about 11.5 g/cm³, and a density of thesecond sub-layer 52 of the tantalum nitride layer, after the plasmatreatment, can be in a range from about 11.5 g/cm³ to about 12.5 g/cm³.For example, the second sub-layer 52 may be denser than the firstsub-layer 50. A density of the tantalum nitride layer (e.g., comprisingthe first sub-layer 50 and the second sub-layer 52) can be in a rangefrom about 11.0 g/cm³ to about 12.0 g/cm³. After the plasma treatment,the tantalum nitride layer that is formed can be the barrier layer ofFIG. 8.

As stated previously, the first thickness T1 of the barrier layer on theupper surface of the conductive feature 24 is less than the secondthickness T2 of the barrier layer on the sidewalls of the seconddielectric layer 28. The difference between the thicknesses T1, T2 canbe caused largely by the difference in incubation time during thedeposition of the first sub-layer 50 in operation 304 of FIG. 12. In aparticular example, the first thickness T1 can be about 11.5 Å, and thesecond thickness T2 can be about 17.5 Å. Hence, in this particularexample, the first thickness T1 can be less than the second thickness T2by an amount of about 34% of the second thickness T2. In other examples,the difference expressed as a percentage can vary depending on, e.g.,the second thickness T2, similar to what was described previously. Moreparticularly, the thickness of the first sub-layer 50 at the firstthickness T1 can be about 1.5 Å, and the thickness of the firstsub-layer 50 at the second thickness T2 can be about 7.5 Å. Thethickness of the second sub-layer 52 can substantially uniformly beabout 10 Å.

Forming a barrier layer by depositing a differentialcarbon-concentration tantalum nitride layer comprising a carbon-richtantalum nitride layer and a carbon-poor tantalum nitride layer canenable beneficial barrier properties while reducing resistance betweenthe conductive feature 24 and the conductive fill material 42.Generally, the thicknesses T1, T2 can enable the reduced resistance andbeneficial barrier properties as described previously. Further,implementing a sub-layer by depositing a carbon-poor tantalum nitridelayer can achieve even better barrier properties because of a greaterdensity that may be achieved, while implementing a sub-layer bydepositing a carbon-rich tantalum nitride layer can reduce or mitigatedamage and carbon depletion in the second dielectric layer 28 (e.g., alow-k dielectric) that might otherwise be caused by the plasmatreatment.

An implementation of operation 304 is next described to achieve thebarrier layer of FIGS. 10 and 1 i. In operation 304, a first number ofcycles is performed using the carbon-rich tantalum nitride precursorgas, with no carbon-poor tantalum nitride precursor gas, to deposit thefirst sub-layer 60. Additionally, the reactant gas may be pulsed in thefirst number of cycles at a low percentage amount, such as equal to orless than 10% of the total flow (e.g., flow of the combined reactant gasand carrier gas). By performing this first number of cycles with thecarbon-rich tantalum nitride precursor gas without the carbon-poortantalum nitride precursor gas, the incubation time difference describedwith respect to FIGS. 6 and 7 may be used to deposit the first sub-layer60 (e.g., a carbon-rich tantalum nitride layer) with differentthicknesses on the upper surface of the conductive feature 24 and onsidewalls of the second dielectric i9 layer 28. In some examples, thefirst number of cycles permits the incubation time difference to elapseand permits the first sub-layer 60 to begin growing on the upper surfaceof the conductive feature 24. Hence, in such examples, a maximumdifference in thicknesses of the first sub-layer 60 (e.g., on theconductive feature 24 versus on the second dielectric layer 28) can beachieved. In other examples, the first number of cycles may not besufficient to permit the incubation time difference to elapse.

To relate the deposition of the first sub-layer 60 to operation 304 morespecifically, at operation 310, the amounts of the precursor gases aredetermined to be 100% carbon-rich tantalum nitride precursor gas and 0%carbon-poor tantalum nitride precursor gas as the precursor gas (e.g.,without considering the carrier gas) to be pulsed in operation 312, andthe amount of the reactant gas is determined to be equal to or less than10% of the total flow (e.g., flow of the combined reactant gas andcarrier gas) to be pulsed in operation 318. The cycle (operations 312,314, 316, 318) is repeated the first number of cycles by operation 320,without the gases being altered by operation 322.

Further in operation 304 after the performance of the first number ofcycles, a second number of cycles is performed using a mixture of thecarbon-poor tantalum nitride precursor gas and the carbon-rich tantalumnitride precursor gas, to deposit the second sub-layer 62 (e.g., acarbon-moderate tantalum nitride layer). For example, the mixture mayinclude about equal amounts by volume or flow of the carbon-richtantalum nitride precursor gas and the carbon-poor tantalum nitrideprecursor gas. Additionally, the reactant gas may be pulsed in thesecond number of cycles at any percentage amount of the total flow(e.g., flow of the combined reactant gas and carrier gas). Varying theamount of the reactant gas can vary the concentration of carbon in thedeposited sub-layer. Generally, and assuming other conditions are thesame, the greater the flow of the reactant gas is, the lower theconcentration of carbon in the deposited sub-layer is, and conversely,the lower the flow of the reactant gas is, the greater the concentrationof carbon in the deposited sub-layer is.

To relate the deposition of the second sub-layer 62 to operation 304more specifically, after the completion of the first number of cycles,at operation 320, a determination is made to repeat the cycle toinitiate the second number of cycles. At operation 322, a determinationis made that the amounts of the gases are to be altered. In response, atoperation 310, for example, the amounts of the precursor gases aredetermined to be 50% carbon-rich tantalum nitride precursor gas and 50%carbon-poor tantalum nitride precursor gas as the precursor gas (e.g.,without considering the carrier gas) to be pulsed in operation 312, andthe amount of the reactant gas is determined to be in a range fromgreater than 0% to about 99% of the total flow (e.g., flow of thecombined reactant gas and carrier gas) to be pulsed in operation 318.The cycle (operations 312, 314, 316, 318) is repeated the second numberof cycles by operation 320, without the gases subsequently being alteredby operation 322.

Further in operation 304 after the performance of the second number ofcycles, a third number of cycles is performed using the carbon-poortantalum nitride precursor gas, with no carbon-rich tantalum nitrideprecursor gas, to deposit the third sub-layer 64 (e.g., a carbon-poortantalum nitride layer). Additionally, the reactant gas may be pulsed inthe second number of cycles at a high percentage amount, such as in arange from about 10% to about 99% of the total flow (e.g., flow of thecombined reactant gas and carrier gas).

To relate the deposition of the third sub-layer 64 to operation 304 morespecifically, after the completion of the second number of cycles, atoperation 320, a determination is made to repeat the cycle to initiatethe third number of cycles. At operation 322, a determination is madethat the amounts of the gases are to be altered. In response, atoperation 310, the amounts of the precursor gases are determined to be0% carbon-rich tantalum nitride precursor gas and 100% carbon-poortantalum nitride precursor gas as the precursor gas (e.g., withoutconsidering the carrier gas) to be pulsed in operation 312, and theamount of the reactant gas is determined to be in a range from about 10%to about 99% of the total flow (e.g., flow of the combined reactant gasand carrier gas) to be pulsed in operation 318. The cycle (operations312, 314, 316, 318) is repeated the third number of cycles by operation320, without the gases subsequently being altered by operation 322. Atthe conclusion of the third number of cycles, at operation 320, adetermination is made that a cycle is to be not repeated, and then,operation 306 is performed.

In operation 306, the differential carbon-concentration tantalum nitridelayer deposited in operation 304 is treated using a plasma process.Generally, the plasma process can remove organic impurities and can alsodensify the differential carbon-concentration tantalum nitride layer.

The carbon-moderate tantalum nitride layer (e.g., the second sub-layer62) can have properties between the ranges of properties described abovefor the carbon-rich tantalum nitride layer and the carbon-poor tantalumnitride layer. Hence, the differential carbon-concentration tantalumnitride layer can permit for balancing and tuning of properties toachieve a desired barrier layer. Additional layers can be implemented inthe differential carbon-concentration tantalum nitride layer.

Even further, by increasing the number of times where the respectiveamounts of the carbon-rich tantalum nitride precursor gas, thecarbon-poor tantalum nitride precursor gas, and/or reactant gas are tobe altered by operation 322, which may correspondingly decrease thenumber of cycles between each alteration of the gases, the differentialcarbon-concentration tantalum nitride layer may begin to approximate orbe a gradient layer, where, as deposited, the gradient layer can have asubstantially continuous gradient concentration of carbon. This canfurther permit for balancing and tuning of properties to achieve adesired barrier layer.

As a specific example, assume that the differential carbon-concentrationtantalum nitride layer is to be deposited using 19 cycles of the ALDprocess of operation 304. At operation 310 for the first cycle, thegases to be pulsed are determined to be: 100% carbon-rich tantalumnitride precursor gas, 0% carbon-poor tantalum nitride precursor gas,and 5% reactant gas consistent with the above description. The firstcycle implements these amounts. After each cycle, a determination atoperation 322 is made that the amounts are to be altered, and atoperation 310, the amounts are determined to: decrease the carbon-richtantalum nitride precursor gas to be 5.55% less, increase thecarbon-poor tantalum nitride precursor gas to be 5.55% more, andincrease the reactant gas to be 5% more. At the last cycle (e.g., cycle19), the gases to be pulsed are determined to be: 0% carbon-richtantalum nitride precursor gas, 100% carbon-poor tantalum nitrideprecursor gas, and 95% reactant gas consistent with the abovedescription.

FIG. 13 is a schematic of a deposition tool for forming a barrier layerin a conductive feature in accordance with some embodiments. Moreparticularly, the deposition tool includes a dual-ampoule supply systemfor delivery of two precursors. The deposition tool includes a chamber402, a first ampoule 404, and a second ampoule 406. A substrate holder408 is disposed in the chamber 402. The substrate holder 408 holds andsecures a substrate during a deposition process. The chamber 402 alsoincludes a gas shower 410 for distributing gases within the chamber 402.Flow lines 412 and valves 414 are configured and operable to fluidlycouple the first ampoule 404 and the second ampoule 406 to the chamber402. The flow lines 412 and valves 414 are configured and operable toselectively transmit a first precursor A from the first ampoule 404, asecond precursor B from the second ampoule 406, one or more carriergases, and a reactant gas to the chamber 402 for dispersion via the gasshower 410.

The deposition tool can be used to implement the deposition processesdescribed above. For example, various valves 414 can be selectivelyopened or closed to begin or stop transmitting the various gases to thechamber 402 to achieve an ambient 416 in the chamber 402. Assuming thefirst precursor A is a carbon-rich tantalum nitride precursor gas andthe second precursor B is the carbon-poor tantalum nitride precursorgas, various valves 414 can be opened or closed to transmit only thefirst precursor A, only the second precursor B, or a mixture of thefirst precursor A and the second precursor B, with or without a carriergas, to the chamber 402 for, e.g., the pulse operation 312. Similarly,various valves 414 can be opened or closed to transmit the reactant gasto the chamber 402 for, e.g., the pulse operation 318. Further, variousvalves 414 can be opened or closed to transmit the carrier gas to thechamber 402 for, e.g., the purge operations 314, 318.

An embodiment is a method for semiconductor processing. An opening isformed through a dielectric layer to a conductive feature. A barrierlayer is formed in the opening along a sidewall of the dielectric layerand on a surface of the conductive feature. Forming the barrier layerincludes depositing a layer including using a first precursor gas. Thefirst precursor gas has a first incubation time for deposition on thesurface of the conductive feature and has a second incubation time fordeposition on the sidewall of the dielectric layer. The first incubationtime is greater than the second incubation time. A conductive fillmaterial is formed in the opening and on the barrier layer.

Another embodiment is a structure. The structure includes a firstdielectric layer over a substrate, a first conductive feature in thefirst dielectric layer, a second dielectric layer over the firstdielectric layer and the first conductive feature, and a secondconductive feature in the second dielectric layer and contacting thefirst conductive feature. The second conductive feature includes abarrier layer and a conductive fill material on the barrier layer. Thebarrier layer is along a sidewall of the second dielectric layer and ona surface of the first conductive feature. The barrier layer has a firstthickness at the sidewall of the second dielectric layer, and thebarrier layer has a second thickness at the surface of the firstconductive feature. The first thickness is greater than the secondthickness.

A further embodiment is a method for semiconductor processing. Anopening is formed through a dielectric layer to a conductive feature. Acarbon-containing layer is deposited in the opening along a sidewall ofthe dielectric layer and on a surface of the conductive feature.Depositing the carbon-containing layer includes using an atomic layerdeposition (ALD) process. The ALD process includes at least one firstcycle comprising pulsing a precursor gas having a carbon concentrationof at least 25 atomic percent and pulsing a reactant gas. Thecarbon-containing layer is densified, and the densification includesexposing the carbon-containing layer to a plasma. After the densifying,the carbon-containing layer is a barrier layer. A conductive fillmaterial is formed in the opening and on the barrier layer.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

1. A method for semiconductor processing, the method comprising: formingan opening through a dielectric layer to a conductive feature; forming abarrier layer in the opening along a sidewall of the dielectric layerand on a surface of the conductive feature, forming the barrier layercomprising depositing a layer comprising using a first precursor gas,the first precursor gas having a first incubation time for deposition onthe surface of the conductive feature and having a second incubationtime for deposition on the sidewall of the dielectric layer, the firstincubation time being greater than the second incubation time; andforming a conductive fill material in the opening and on the barrierlayer.
 2. The method of claim 1, wherein the barrier layer has a firstthickness at the sidewall of the dielectric layer, and the barrier layerhas a second thickness at the surface of the conductive feature, thefirst thickness being greater than the second thickness.
 3. The methodof claim 1, wherein the first precursor gas has a carbon concentrationof at least 25 atomic percent.
 4. The method of claim 1, wherein thebarrier layer includes tantalum nitride.
 5. The method of claim 1,wherein forming the barrier layer further comprises: performing acleaning process through the opening to the surface of the conductivefeature, performing the cleaning process comprising using a plasma witha reducing gas; performing an atomic layer deposition (ALD) process todeposit the layer, the ALD process comprising at least one cyclecomprising pulsing the first precursor gas and pulsing a reactant gas;and densifying the layer to form the barrier layer, the densifyingcomprising exposing the layer to a plasma.
 6. The method of claim 1,wherein depositing the layer comprises performing a plurality of cycles,each of the plurality of cycles comprising: pulsing the first precursorgas; and pulsing a reactant gas.
 7. The method of claim 6, wherein thelayer is a carbon-containing tantalum nitride layer having aconcentration of carbon of at least 15 atomic percent throughout.
 8. Themethod of claim 1, wherein depositing the layer comprises: performing aplurality of first cycles; and after performing the plurality of firstcycles, performing a plurality of second cycles; wherein each of theplurality of first cycles comprises: pulsing the first precursor gaswithout a second precursor gas, wherein the first precursor gas has acarbon concentration of at least 25 atomic percent, wherein the secondprecursor gas has a carbon concentration of less than 25 atomic percent;and pulsing a reactant gas; and wherein each of the plurality of secondcycles comprises: pulsing the second precursor gas without the firstprecursor gas; and pulsing the reactant gas.
 9. The method of claim 8,wherein the layer comprises: a first carbon-containing tantalum nitridesub-layer having a concentration of carbon of at least 15 atomic percentformed by the plurality of first cycles; and a second carbon-containingtantalum nitride sub-layer having a concentration of carbon of less than15 atomic percent formed by the plurality of second cycles.
 10. Themethod of claim 1, wherein depositing the layer comprises: performing afirst cycle; after performing the first cycle, performing a secondcycle; and after performing the second cycle, performing a third cycle;wherein the first cycle comprises: pulsing the first precursor gaswithout a second precursor gas, wherein the first precursor gas has acarbon concentration of at least 25 atomic percent, wherein the secondprecursor gas has a carbon concentration of less than 25 atomic percent;and pulsing a reactant gas; wherein the second cycle comprises: pulsinga mixture comprising the first precursor gas and the second precursorgas; and pulsing the reactant gas; and wherein the third cyclecomprises: pulsing the second precursor gas without the first precursorgas; and pulsing the reactant gas.
 11. The method of claim 10, whereinthe layer is a carbon-containing tantalum nitride layer having agradient concentration of carbon. 12.-17. (canceled)
 18. A method forsemiconductor processing, the method comprising: forming an openingthrough a dielectric layer to a conductive feature; depositing acarbon-containing layer in the opening along a sidewall of thedielectric layer and on a surface of the conductive feature, depositingthe carbon-containing layer comprising using an atomic layer deposition(ALD) process, the ALD process comprising at least one first cyclecomprising: pulsing a first precursor gas having a carbon concentrationof at least 25 atomic percent, the first precursor gas having a firstincubation time for deposition on the surface of the conductive featureand having a second incubation time for deposition on the sidewall ofthe dielectric layer, the first incubation time being greater than thesecond incubation time; and pulsing a reactant gas; densifying thecarbon-containing layer comprising exposing the carbon-containing layerto a plasma, wherein after the densifying, the carbon-containing layeris a barrier layer; and forming a conductive fill material in theopening and on the barrier layer.
 19. The method of claim 18, whereinthe carbon-containing layer is a carbon-containing tantalum nitridelayer.
 20. The method of claim 18, wherein the ALD process furthercomprises at least one second cycle comprising: pulsing a secondprecursor gas having a carbon concentration less than 25 atomic percent;and pulsing the reactant gas.
 21. A method for semiconductor processing,the method comprising: forming an opening through a dielectric layer toa conductive feature; forming a carbon-containing barrier layer in theopening along a sidewall of the dielectric layer and on a surface of theconductive feature, forming the carbon-containing barrier layercomprising performing a plurality of cycles, each of the plurality ofcycles comprising: pulsing a carbon-containing precursor gas, thecarbon-containing precursor gas having a first incubation time fordeposition on the surface of the conductive feature and having a secondincubation time for deposition on the sidewall of the dielectric layer,the first incubation time being greater than the second incubation time;and pulsing a reactant gas; and forming a conductive fill material inthe opening and on the carbon-containing barrier layer.
 22. The methodof claim 21, wherein after the first incubation time and the secondincubation time elapses, a deposition rate on the sidewall and adeposition rate on the conductive feature are substantially a same rate.23. The method of claim 21, wherein the carbon-containing precursor gascomprises a carbon-rich tantalum nitride precursor.
 24. The method ofclaim 23, wherein a first cycle of the plurality of cycles uses acarbon-rich tantalum nitride precursor as the carbon-containingprecursor gas and a second cycle of the plurality of cycles uses acarbon-poor tantalum nitride precursor as the carbon-containingprecursor gas.
 25. The method of claim 24, wherein the first cycle isperformed prior to the second cycle.
 26. The method of claim 21 furthercomprising exposing the carbon-containing barrier layer to a plasma.